Czochralski equipments (four equipments: L, A, S, 6) adapted with control diameter, max. T 1400C, air atmosphere, pulling rate 0.1-30 mm/h, rotation rate 2-60 rpm.

Czochralski equipments with controlled atmosphere (two equipments: C, O) and adapted with control diameter, max. T 1400C, pulling rate 0.5-30mm/h, rotation rate 5-60rpm.

Czochralski equipment with controlled gas flux (one equipment: 7) adapted with control diameter, max. T 1400 C, pulling rate (0.033-30mm/h, rotation rate 5-60 rpm, equipped with control diameter.

Vertical Gradient Freeze (VGF) technique for the growth of high quality CdZnTe (CZT crystals), for the growth of high quality CZT single crystals, we have designed and fabricated the five zone VGF furnace.

Bridgman oscillatory equipments ( B1, B2), 180º rotation, max. T 1000ºC, completely computerized, facilities to sealed ampoules. Growth velocity 0.1-100mm/h.

Bridgman equipments with two heating zones, max. T 1000ºC Vapor growth possibilities, three zones of temperature, max. T 1200ºC

Liquid phase epitaxy equipment. Horizontal with control atmosphere (H or N gas flux), system for multilayer growth. Max. T 800ºC.

Films deposition equipment: sputtering. Electron gun Alcatel equipment, vacuum up to 10-6 Torr, filament heating.

COREMA - COntacless Resistivity Mapping: automatic equipment for measuring the volume resistivity of samples with a range of 10E5-10E10 ohm.cm

2.SAMPLE PREPARATION

a) Glove box: for sample preparation in inert atmosphere. Inert gas system mBraun GmbH.

b) Cutting machines:-two diamond disk cutting machines from South Bay Tech. (model 660), possibilities for coupling a goniometer for sample orientation. -one diamond wire cutting machine, from Well ( model 3242) -three nylon wire cutting machine, from South Bay Tech.

c) Polishing machines:-developed in our laboratory (four equipments), polishing quality up to ¼ microns. -One commercial high quality Logitech polishing machine (model PM5) optical quality.

d) Sample orientation:-3D goniometer adapted to the diamond disk cutting machine (2 goniometers) -Software support for sample orientation based on X-ray Laue orientation

e) post growth treatment:-furnaces for annealing, poling and heat treatment in controlled atmosphere up to 1200ºC.

3.METHODS OF SAMPLE CHARACTERIZATION

Microscopy facilities:Optical microscopy (Zeiss), Balances, Grinding machine, Differential Thermal Analysis equipment Perkin Elmer DTA 1700, Atomic absoption Perkin Elmer, mod. 3110

Access to different techniques of analysis through the Inter-department Research Service, web site: http://www.uam.es/investigacion/servicios/sidi/

4. EQUIPMENT DEVELOPMENT

Modification online of all equipments http://www.uam.es/investigacion/servicios/segainvex/